Senior Theses
Publication Date
5-25-2017
Document Type
Thesis (Open Access)
Degree Name
Bachelor of Science in Physics
Department
Physics
Faculty Advisor(s)
Michael Crosser (Thesis Advisor) Tianbao Xie & Joelle Murray (Committee Members)
Subject Categories
Biological and Chemical Physics | Materials Science and Engineering | Nanoscience and Nanotechnology | Physics
Abstract
This research was to verify the hypothesis that resistivity of metal's thin film deposited in a low-pressure environment is the same as its solid material. Thermal Evaporation is a thin film deposition technique in which metal inside a vacuum is evaporated, then deposited onto a surface. Higher quality metal films are deposited when the vacuum pressure is lower. At higher pressures, more air molecules are trapped within the layers of metal, thus increasing scattering sites and increasing the resistance. However, reaching a lower pressure requires more time and effort. In this research, films were deposited at various pressures and resistivities were calculated for each film to determine an ideal pressure range that creates the least resistivity.
Recommended Citation
Grace, James Kela Yee Keen, "Thin Film Thermal Deposition at Various Pressures" (2017). Senior Theses. 30.
https://digitalcommons.linfield.edu/physstud_theses/30
Included in
Biological and Chemical Physics Commons, Materials Science and Engineering Commons, Nanoscience and Nanotechnology Commons
