Thermal Filament Deposition at Various Pressures
Faculty Sponsor(s)
Joelle Murray and Michael Crosser
Location
Jereld R. Nicholson Library: Grand Avenue
Subject Area
Physics/Applied Physics
Description
Thin film deposition is a useful technique used to apply a thin film of metal to an object by evaporating the metal in a vacuum. A low pressure vacuum enables a film of higher quality than one created under a higher pressure vacuum. Creating films at various pressures will aid in finding a pressure level that is low enough to create a quality film, while within a reasonable range that is possible with the technology available. An ideal pressure has been derived from the Drude model, as well as from common thermal dynamic physics. Details of the methods used as well as an analysis of the data are provided.
Recommended Citation
Grace, James KYK, "Thermal Filament Deposition at Various Pressures" (2017). Linfield University Student Symposium: A Celebration of Scholarship and Creative Achievement. Event. Submission 74.
https://digitalcommons.linfield.edu/symposium/2017/all/74
Thermal Filament Deposition at Various Pressures
Jereld R. Nicholson Library: Grand Avenue
Thin film deposition is a useful technique used to apply a thin film of metal to an object by evaporating the metal in a vacuum. A low pressure vacuum enables a film of higher quality than one created under a higher pressure vacuum. Creating films at various pressures will aid in finding a pressure level that is low enough to create a quality film, while within a reasonable range that is possible with the technology available. An ideal pressure has been derived from the Drude model, as well as from common thermal dynamic physics. Details of the methods used as well as an analysis of the data are provided.
