Submission Title

Thermal Filament Deposition at Various Pressures

Location

Jereld R. Nicholson Library: Grand Avenue

Subject Area

Physics/Applied Physics

Description

Thin film deposition is a useful technique used to apply a thin film of metal to an object by evaporating the metal in a vacuum. A low pressure vacuum enables a film of higher quality than one created under a higher pressure vacuum. Creating films at various pressures will aid in finding a pressure level that is low enough to create a quality film, while within a reasonable range that is possible with the technology available. An ideal pressure has been derived from the Drude model, as well as from common thermal dynamic physics. Details of the methods used as well as an analysis of the data are provided.

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Thermal Filament Deposition at Various Pressures

Jereld R. Nicholson Library: Grand Avenue

Thin film deposition is a useful technique used to apply a thin film of metal to an object by evaporating the metal in a vacuum. A low pressure vacuum enables a film of higher quality than one created under a higher pressure vacuum. Creating films at various pressures will aid in finding a pressure level that is low enough to create a quality film, while within a reasonable range that is possible with the technology available. An ideal pressure has been derived from the Drude model, as well as from common thermal dynamic physics. Details of the methods used as well as an analysis of the data are provided.