Senior Theses

Publication Date

5-25-2017

Document Type

Thesis (Open Access)

Degree Name

Bachelor of Science in Physics

Department

Physics

Faculty Advisor(s)

Michael Crosser (thesis advisor)
Tianbao Xie & Joelle Murray (committee members)

Subject Categories

Biological and Chemical Physics | Materials Science and Engineering | Nanoscience and Nanotechnology | Physics

Abstract

This research was to verify the hypothesis that resistivity of metal's thin film deposited in a low-pressure environment is the same as its solid material. Thermal Evaporation is a thin film deposition technique in which metal inside a vacuum is evaporated, then deposited onto a surface. Higher quality metal films are deposited when the vacuum pressure is lower. At higher pressures, more air molecules are trapped within the layers of metal, thus increasing scattering sites and increasing the resistance. However, reaching a lower pressure requires more time and effort. In this research, films were deposited at various pressures and resistivities were calculated for each film to determine an ideal pressure range that creates the least resistivity.

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